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Atomic layer deposition of functional multicomponent oxides
Author(s):
Mariona Coll
1
,
Mari Napari
2
Publication date
Created:
November 01 2019
Publication date
(Print):
November 01 2019
Journal:
APL Materials
Publisher:
AIP Publishing
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Atomic Force Microscopy
Most cited references
211
Record
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Atomic layer deposition: an overview.
Steven George
(2010)
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Ferroelectricity in hafnium oxide thin films
T. Böscke
,
J. Müller
,
D. Bräuhaus
…
(2011)
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P-type electrical conduction in transparent thin films of CuAlO2
Hideo Hosono
,
Hiroshi Kawazoe
,
Masahiro Yasukawa
…
(1997)
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Author and article information
Journal
Title:
APL Materials
Abbreviated Title:
APL Materials
Publisher:
AIP Publishing
ISSN (Electronic):
2166-532X
Publication date Created:
November 01 2019
Publication date (Print):
November 01 2019
Volume
: 7
Issue
: 11
Page
: 110901
Affiliations
[
1
]
Institut de Ciència de Materials de Barcelona ICMAB-CSIC, Campus UAB, 08193 Bellaterra, Spain
[
2
]
Department of Materials Science and Metallurgy, University of Cambridge, 27 Charles Babbage Road, Cambridge CB3 0FS, United Kingdom
Article
DOI:
10.1063/1.5113656
SO-VID:
8aa56e4c-84ab-4ea9-bca6-6eedfb5380ec
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© 2019
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