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      Atomic layer deposition of functional multicomponent oxides

      Author(s): 1 , 2
      Publication date Created:
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      Journal: APL Materials
      Publisher: AIP Publishing

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          Atomic layer deposition: an overview.

          Steven George (2010)
          Article 0 comments Cited 930 times – based on 0 reviews     Review now
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            Ferroelectricity in hafnium oxide thin films

            T. Böscke, J. Müller, D. Bräuhaus … (2011)
            Article 0 comments Cited 420 times – based on 0 reviews     Review now
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              P-type electrical conduction in transparent thin films of CuAlO2

              Hideo Hosono, Hiroshi Kawazoe, Masahiro Yasukawa … (1997)
              Article 0 comments Cited 309 times – based on 0 reviews     Review now
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                Author and article information

                Journal
                Title: APL Materials
                Abbreviated Title: APL Materials
                Publisher: AIP Publishing
                ISSN (Electronic): 2166-532X
                Publication date Created: November 01 2019
                Publication date (Print): November 01 2019
                Volume: 7
                Issue: 11
                Page: 110901
                Affiliations
                [1 ]Institut de Ciència de Materials de Barcelona ICMAB-CSIC, Campus UAB, 08193 Bellaterra, Spain
                [2 ]Department of Materials Science and Metallurgy, University of Cambridge, 27 Charles Babbage Road, Cambridge CB3 0FS, United Kingdom
                Article
                DOI: 10.1063/1.5113656
                SO-VID: 8aa56e4c-84ab-4ea9-bca6-6eedfb5380ec
                Copyright © © 2019
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