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      Synchrotron radiation‐excited chemical vapor deposition of SixNyHzfilm

      Author(s): ,
      Publication date Created:
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      Journal: Journal of Applied Physics
      Publisher: AIP Publishing

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          The hydrogen content of plasma-deposited silicon nitride

          M Rand, W A Lanford (1978)
          Article 0 comments Cited 167 times – based on 0 reviews     Review now
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            A review of laser–microchemical processing

            D. Ehrlich (1983)
            Article 0 comments Cited 95 times – based on 0 reviews     Review now
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              Temperature profiles induced by a scanning cw laser beam

              R. Hendel, J. Moody (1982)
              Article 0 comments Cited 67 times – based on 0 reviews     Review now
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                Author and article information

                Journal
                Title: Journal of Applied Physics
                Abbreviated Title: Journal of Applied Physics
                Publisher: AIP Publishing
                ISSN (Print): 0021-8979
                ISSN (Electronic): 1089-7550
                Publication date Created: March 1987
                Publication date (Print): March 1987
                Volume: 61
                Issue: 5
                Pages: 2035-2037
                Article
                DOI: 10.1063/1.338001
                SO-VID: 0246ba70-8225-4138-8c59-04269abbdfd7
                Copyright © © 1987
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