Evolution of the electrical and structural properties during the growth of Al doped ZnO films by remote plasma-enhanced metalorganic chemical vapor deposition

Volintiru, I.; Creatore, M.; Kniknie, B. J.; Spee, C. I. M. A.; van de Sanden, M. C. M.

doi:10.1063/1.2772569

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Evolution of the electrical and structural properties during the growth of Al doped ZnO films by remote plasma-enhanced metalorganic chemical vapor deposition

Author(s): I. Volintiru , M. Creatore , B. J. Kniknie , C. I. M. A. Spee , M. C. M. van de Sanden

Publication date Created: August 15 2007

Publication date (Print): August 15 2007

Journal: Journal of Applied Physics

Publisher: AIP Publishing

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TCO and light trapping in silicon thin film solar cells

Joachim. Müller, Bernd Rech, Jiri Springer … (2004)

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Textured aluminum‐doped zinc oxide thin films from atmospheric pressure chemical‐vapor deposition

Roy G Gordon, Jianhua Hu (1992)

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X-Ray Diffraction

C. Suryanarayana, M. Grant Norton (1998)

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Journal

Title: Journal of Applied Physics

Abbreviated Title: Journal of Applied Physics

Publisher: AIP Publishing

ISSN (Print): 0021-8979

ISSN (Electronic): 1089-7550

Publication date Created: August 15 2007

Publication date (Print): August 15 2007

Volume: 102

Issue: 4

Page: 043709

Article

DOI: 10.1063/1.2772569

SO-VID: 044a88af-e03b-4720-8c15-31691540e588

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Evolution of the electrical and structural properties during the growth of Al doped ZnO films by remote plasma-enhanced metalorganic chemical vapor deposition

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Most cited references 27

TCO and light trapping in silicon thin film solar cells

Textured aluminum‐doped zinc oxide thin films from atmospheric pressure chemical‐vapor deposition

X-Ray Diffraction

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