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      High power impulse magnetron sputtering discharge

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          Principles of Plasma Discharges and Materials Processing

          Michael A. Lieberman, Allan Lichtenberg (2005)
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            Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline Targets

            Peter Sigmund (1969)
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              Introduction to Plasma Physics and Controlled Fusion

              Francis Chen (1984)
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                Author and article information

                Journal
                Title: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
                Abbreviated Title: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
                Publisher: American Vacuum Society
                ISSN (Print): 0734-2101
                ISSN (Electronic): 1520-8559
                Publication date Created: May 2012
                Publication date (Print): May 2012
                Volume: 30
                Issue: 3
                Page: 030801
                Article
                DOI: 10.1116/1.3691832
                SO-VID: 0575457f-ff32-40f1-af01-ceae3a18a550
                Copyright © © 2012
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