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      Resistance random access memory based on a thin film of CdS nanocrystals prepared via colloidal synthesis.

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          Abstract

          We demonstrate that resistance random access memory (RRAM) can be fabricated based on CdS-nanocrystal thin films. A simple drop-drying of the CdS-nanocrystal solution leads to the formation of uniform thin films with controlled thickness. RRAMs with a Ag/Al(2) O(3) /CdS/Pt structure show bipolar switching behavior, with average values of the set voltage (V(Set) ) and reset voltage (V(Reset) ) of 0.15 V and -0.19 V, respectively. The RRAM characteristics are critically influenced by the thickness of the Al(2) O(3) barrier layer, which prevents significant migration of Ag into the CdS layer as revealed by Auger electron spectroscopy (AES). Interestingly, RRAM without an Al(2) O(3) layer (i.e., Ag/CdS/Pt structure) also shows bipolar switching behavior, but the polarity is opposite to that of RRAM with the Al(2) O(3) layer (i.e., Ag/Al(2) O(3) /CdS/Pt structure). The operation of both kinds of devices can be explained by the conventional conductive bridging mechanism. Additionally, we fabricated RRAM devices on Kapton film for potential applications in flexible electronics, and the performance of this RRAM device was comparable to that of RRAMs fabricated on hard silicon substrates. Our results show a new possibility of using chalcogenide nanocrystals for RRAM applications.

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          Author and article information

          Journal
          Small
          Small (Weinheim an der Bergstrasse, Germany)
          Wiley-Blackwell
          1613-6829
          1613-6810
          Sep 24 2012
          : 8
          : 18
          Affiliations
          [1 ] Department of Materials Science and Engineering, Korea University, Seoul 136-713, Republic of Korea.
          Article
          10.1002/smll.201200488
          22730193
          06078013-1e90-450e-9081-7fadacd0c446
          History

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