70
views
0
recommends
+1 Recommend
0 collections
    0
    shares
      • Record: found
      • Abstract: not found
      • Article: not found

      Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process

      Journal of Applied Physics
      AIP Publishing

      Read this article at

      ScienceOpenPublisher
      Bookmark
          There is no author summary for this article yet. Authors can add summaries to their articles on ScienceOpen to make them more accessible to a non-specialist audience.

          Related collections

          Most cited references1,025

          • Record: found
          • Abstract: not found
          • Article: not found

          High-κ gate dielectrics: Current status and materials properties considerations

            Bookmark
            • Record: found
            • Abstract: not found
            • Article: not found

            Low-Temperature Al2O3Atomic Layer Deposition

              Bookmark
              • Record: found
              • Abstract: not found
              • Article: not found

              High dielectric constant oxides

                Bookmark

                Author and article information

                Journal
                Journal of Applied Physics
                Journal of Applied Physics
                AIP Publishing
                0021-8979
                1089-7550
                June 15 2005
                June 15 2005
                : 97
                : 12
                : 121301
                Article
                10.1063/1.1940727
                129ebd8c-1f51-4f00-9c2b-b5674d55d980
                © 2005
                History
                Product
                Self URI (article page): http://aip.scitation.org/doi/10.1063/1.1940727

                Comments

                Comment on this article