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      Replica molding of high-aspect-ratio polymeric nanopillar arrays with high fidelity.

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          Abstract

          Polymeric nanostructures with high aspect ratios, so-called nanopillars, are of interest for a wide range of applications. However, it remains a challenge to fabricate high-density, polymeric nanopillars using soft lithography when the feature size is decreased to hundreds of nanometers and the structures are close to each other. Here, we investigate the fidelity of replica molding technique to fabricate polymer nanopillar arrays with diameters ranging from 300 nm to 1 mum, and we compare the experimental results to the theoretical prediction to understand the nature of the instability of nanopillars. Nanopillars molded from soft materials, poly(dimethylsiloxane) (PDMS), mainly ground collapse due to the adhesive force when the aspect ratio is above 6, whereas those from stiffer materials, polyurethane and epoxy, collapse laterally at a much higher aspect ratio (>/=12), of which the critical value is dependent on the nanopillar's feature size, spacing, height, and shape. Further, we attempt to restore the collapsed high-aspect-ratio nanopillars using supercritical CO(2) drying.

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          Author and article information

          Journal
          Langmuir
          Langmuir : the ACS journal of surfaces and colloids
          American Chemical Society (ACS)
          0743-7463
          0743-7463
          Sep 26 2006
          : 22
          : 20
          Affiliations
          [1 ] Department of Materials Science and Engineering, University of Pennsylvania, Philadelphia, Pennsylvania 19104, USA.
          Article
          10.1021/la061372+
          16981781
          13c995f4-bb37-411b-89c9-33d490129255
          History

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