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      Fundamental processes in Si/Si and Ge/Si epitaxy studied by scanning tunneling microscopy during growth

      Surface Science Reports
      Elsevier BV

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          Nucleation and growth of thin films

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            Dislocation-free Stranski-Krastanow growth of Ge on Si(100).

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              7 × 7 Reconstruction on Si(111) Resolved in Real Space

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                Author and article information

                Journal
                Surface Science Reports
                Surface Science Reports
                Elsevier BV
                01675729
                September 2001
                September 2001
                : 43
                : 5-8
                : 127-254
                Article
                10.1016/S0167-5729(01)00012-7
                16cb9b16-ba05-442c-8aab-dd681c46ad1a
                © 2001

                http://www.elsevier.com/tdm/userlicense/1.0/

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