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Fundamental processes in Si/Si and Ge/Si epitaxy studied by scanning tunneling microscopy during growth
Author(s):
Bert Voigtländer
Publication date
Created:
September 2001
Publication date
(Print):
September 2001
Journal:
Surface Science Reports
Publisher:
Elsevier BV
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226
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Nucleation and growth of thin films
J A Venables
,
G Spiller
,
M Hanbucken
(1984)
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Dislocation-free Stranski-Krastanow growth of Ge on Si(100).
D. J. Eaglesham
,
M Cerullo
(1990)
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7 × 7 Reconstruction on Si(111) Resolved in Real Space
G. Binnig
,
H Rohrer
,
Ch. Gerber
…
(1983)
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Author and article information
Journal
Title:
Surface Science Reports
Abbreviated Title:
Surface Science Reports
Publisher:
Elsevier BV
ISSN (Print):
01675729
Publication date Created:
September 2001
Publication date (Print):
September 2001
Volume
: 43
Issue
: 5-8
Pages
: 127-254
Article
DOI:
10.1016/S0167-5729(01)00012-7
SO-VID:
16cb9b16-ba05-442c-8aab-dd681c46ad1a
Copyright ©
© 2001
License:
http://www.elsevier.com/tdm/userlicense/1.0/
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