A novel pulsed magnetron sputter technique utilizing very high target power densities

Kouznetsov, Vladímir V.; Petrov, Ivan; Helmersson, Ulf; Schneider, Jochen M.; Macák, Karol

doi:10.1016/S0257-8972(99)00292-3

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A novel pulsed magnetron sputter technique utilizing very high target power densities

Author(s): Vladimir Kouznetsov , Karol Macák , Jochen M. Schneider , Ulf Helmersson , Ivan Petrov

Publication date Created: December 1999

Publication date (Print): December 1999

Journal: Surface and Coatings Technology

Publisher: Elsevier BV

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Metal ion deposition from ionized mangetron sputtering discharge

S Rossnagel (1994)

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Mass and energy resolved detection of ions and neutral sputtered species incident at the substrate during reactive magnetron sputtering of Ti in mixed Ar+N2 mixtures

J. Greene, J. Abelson, A. Myers … (1994)

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Rotating Plasmas

B. Lehnert (1971)

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Author and article information

Journal

Title: Surface and Coatings Technology

Abbreviated Title: Surface and Coatings Technology

Publisher: Elsevier BV

ISSN (Print): 02578972

Publication date Created: December 1999

Publication date (Print): December 1999

Volume: 122

Issue: 2-3

Pages: 290-293

Article

DOI: 10.1016/S0257-8972(99)00292-3

SO-VID: 19b38d1b-bc32-4935-8022-a7c1d0dff575

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http://www.elsevier.com/tdm/userlicense/1.0/

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A novel pulsed magnetron sputter technique utilizing very high target power densities

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Most cited references 5

Metal ion deposition from ionized mangetron sputtering discharge

Mass and energy resolved detection of ions and neutral sputtered species incident at the substrate during reactive magnetron sputtering of Ti in mixed Ar+N2 mixtures

Rotating Plasmas

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Article

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