Infrared spectroscopy of Si(111) and Si(100) surfaces after HF treatment: Hydrogen termination and surface morphology

Burrows, V. A.; Chabal, Y. J.; Higashi, G. S.; RAGHAVACHARI, K.

doi:10.1116/1.575980

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Infrared spectroscopy of Si(111) and Si(100) surfaces after HF treatment: Hydrogen termination and surface morphology

Author(s): Y. J. Chabal , G. S. Higashi , K. Raghavachari , V. A. Burrows

Publication date Created: May 1989

Publication date (Print): May 1989

Journal: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Publisher: American Vacuum Society

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Title: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Abbreviated Title: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Publisher: American Vacuum Society

ISSN (Print): 0734-2101

ISSN (Electronic): 1520-8559

Publication date Created: May 1989

Publication date (Print): May 1989

Volume: 7

Issue: 3

Pages: 2104-2109

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DOI: 10.1116/1.575980

SO-VID: 1d681e72-c9b7-40e8-9ac0-4b43d8290ef9

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Infrared spectroscopy of Si(111) and Si(100) surfaces after HF treatment: Hydrogen termination and surface morphology

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