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      Chemical and Molecular Variations in Commercial Epoxide Photoresists for X-ray Lithography

      , , , , ,
      Applied Sciences
      MDPI AG

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          Mass spectrometry of synthetic polymers by UV-matrix-assisted laser desorption/ionization

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            Mechanism of Resist Pattern Collapse during Development Process

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              Polymerization optimization of SU-8 photoresist and its applications in microfluidic systems and MEMS

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                Author and article information

                Journal
                ASPCC7
                Applied Sciences
                Applied Sciences
                MDPI AG
                2076-3417
                April 2018
                March 30 2018
                : 8
                : 4
                : 528
                Article
                10.3390/app8040528
                1fdca7c1-e873-4d4e-bd25-9276d2ca78b8
                © 2018

                https://creativecommons.org/licenses/by/4.0/

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