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3,522
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Chemical and Molecular Variations in Commercial Epoxide Photoresists for X-ray Lithography
Author(s):
Vitor Vlnieska
,
Margarita Zakharova
,
Martin Börner
,
Klaus Bade
,
Jürgen Mohr
,
Danays Kunka
Publication date
Created:
April 2018
Publication date
(Electronic):
March 30 2018
Journal:
Applied Sciences
Publisher:
MDPI AG
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40
Record
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: not found
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Mass spectrometry of synthetic polymers by UV-matrix-assisted laser desorption/ionization
Andreas. Deppe
,
Michael Karas
,
Franz Hillenkamp
…
(2002)
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Mechanism of Resist Pattern Collapse during Development Process
Toshihiko Tanaka
,
Nobufumi Atoda
,
Mitsuaki Morigami
(1993)
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Polymerization optimization of SU-8 photoresist and its applications in microfluidic systems and MEMS
L Yang
,
H Q Gong
,
J ZHANG
…
(2001)
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Author and article information
Journal
Journal ID (publisher-id):
ASPCC7
Title:
Applied Sciences
Abbreviated Title:
Applied Sciences
Publisher:
MDPI AG
ISSN (Electronic):
2076-3417
Publication date Created:
April 2018
Publication date (Electronic):
March 30 2018
Volume
: 8
Issue
: 4
Page
: 528
Article
DOI:
10.3390/app8040528
SO-VID:
1fdca7c1-e873-4d4e-bd25-9276d2ca78b8
Copyright ©
© 2018
License:
https://creativecommons.org/licenses/by/4.0/
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