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      An ultra-low on-resistance power MOSFET fabricated by using a fully self-aligned process

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          Anisotropic plasma etching of polysilicon

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            Modeling of the on-resistance of LDMOS, VDMOS, and VMOS power transistors

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              A new vertical power MOSFET structure with extremely reduced on-resistance

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                Author and article information

                Journal
                IEEE Transactions on Electron Devices
                IEEE Trans. Electron Devices
                Institute of Electrical and Electronics Engineers (IEEE)
                0018-9383
                April 1987
                April 1987
                : 34
                : 4
                : 926-930
                Article
                10.1109/T-ED.1987.23017
                2088c985-997a-42c9-b04e-bdbd4440712a
                © 1987
                History

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