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      Multilayer heterogeneous electrical insulation structure of HfO2/Al2O3 for high-temperature thin-film sensor on superalloy substrate

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          Electronic properties of hafnium oxide: A contribution from defects and traps

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            Nanoindentation Investigation of HfO[sub 2] and Al[sub 2]O[sub 3] Films Grown by Atomic Layer Deposition

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              Growth and structure control of HfO2−x films with cubic and tetragonal structures obtained by ion beam assisted deposition

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                Author and article information

                Contributors
                Journal
                Applied Surface Science
                Applied Surface Science
                Elsevier BV
                01694332
                January 2024
                January 2024
                : 642
                : 158592
                Article
                10.1016/j.apsusc.2023.158592
                215a0d24-26a5-49fa-8092-9cb5c49cc6c4
                © 2024

                https://www.elsevier.com/tdm/userlicense/1.0/

                https://doi.org/10.15223/policy-017

                https://doi.org/10.15223/policy-037

                https://doi.org/10.15223/policy-012

                https://doi.org/10.15223/policy-029

                https://doi.org/10.15223/policy-004

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