A new method for treating fluorine wastewater to reduce sludge and running costs

Toyoda, A; Taira, T

doi:10.1109/66.857940

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A new method for treating fluorine wastewater to reduce sludge and running costs

Author(s): A. Toyoda , T. Taira

Publication date (Print): Aug. 2000

Journal: IEEE Transactions on Semiconductor Manufacturing

Publisher: Institute of Electrical and Electronics Engineers (IEEE)

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Selective Adsorption of Fluoride Ion by La(III)-loaded Chelating Resin Having Phosphonomethylamino Groups

Masatoshi Kanesato, Toshiro Yokoyama, Toshishige M Suzuki (1988)

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Removal of Fluoride Ion by a Porous Spherical Resin Loaded with Hydrous Zirconium Oxide

T.M. Suzuki, C. Chida, M. Kanesato … (1989)

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A high level treatment of fluorine wastewater to reduce sludge

A. Toyoda, T. Taira (2024)

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Journal

Title: IEEE Transactions on Semiconductor Manufacturing

Abbreviated Title: IEEE Trans. Semicond. Manufact.

Publisher: Institute of Electrical and Electronics Engineers (IEEE)

ISSN (Print): 08946507

Publication date (Print): Aug. 2000

Volume: 13

Issue: 3

Pages: 305-309

Article

DOI: 10.1109/66.857940

SO-VID: 25b1ebf6-61bf-4d24-8e60-96f64ca9c6ec

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A new method for treating fluorine wastewater to reduce sludge and running costs

Read this article at

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Chinese Journal of Radiological Health

Most cited references 4

Selective Adsorption of Fluoride Ion by La(III)-loaded Chelating Resin Having Phosphonomethylamino Groups

Removal of Fluoride Ion by a Porous Spherical Resin Loaded with Hydrous Zirconium Oxide

A high level treatment of fluorine wastewater to reduce sludge

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