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      Characterization of CdTe quantum dots grown on Si(111) by hot wall epitaxy

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      Journal of Applied Physics
      AIP Publishing

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          Dislocation-free Stranski-Krastanow growth of Ge on Si(100).

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            Growth by molecular beam epitaxy and characterization of InAs/GaAs strained‐layer superlattices

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              Shape transition of germanium nanocrystals on a silicon (001) surface from pyramids to domes

              Chemical vapor deposition of germanium onto the silicon (001) surface at atmospheric pressure and 600 degrees Celsius has previously been shown to produce distinct families of smaller (up to 6 nanometers high) and larger (all approximately 15 nanometers high) nanocrystals. Under ultrahigh-vacuum conditions, physical vapor deposition at approximately the same substrate temperature and growth rate produced a similar bimodal size distribution. In situ scanning tunneling microscopy revealed that the smaller square-based pyramids transform abruptly during growth to significantly larger multifaceted domes, and that few structures with intermediate size and shape remain. Both nanocrystal shapes have size-dependent energy minima that result from the interplay between strain relaxation at the facets and stress concentration at the edges. A thermodynamic model similar to a phase transition accounts for this abrupt morphology change.
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                Author and article information

                Journal
                Journal of Applied Physics
                Journal of Applied Physics
                AIP Publishing
                0021-8979
                1089-7550
                January 15 2003
                January 15 2003
                : 93
                : 2
                : 1195-1198
                Article
                10.1063/1.1530364
                25c4789f-1f90-4c49-ad40-b456fc98d6d6
                © 2003
                History

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