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High aspect ratio silicon etch: A review
Author(s):
Banqiu Wu
,
Ajay Kumar
,
Sharma Pamarthy
Publication date
Created:
September 2010
Publication date
(Print):
September 2010
Journal:
Journal of Applied Physics
Publisher:
AIP Publishing
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Silicon thin film solar cells
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Anisotropic etching of silicon
K.E. Bean
(1978)
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Microscopic uniformity in plasma etching
Richard A. Gottscho
(1992)
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Characterization of a Time Multiplexed Inductively Coupled Plasma Etcher
A. Ayón
(1999)
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Author and article information
Journal
Title:
Journal of Applied Physics
Abbreviated Title:
Journal of Applied Physics
Publisher:
AIP Publishing
ISSN (Print):
0021-8979
ISSN (Electronic):
1089-7550
Publication date Created:
September 2010
Publication date (Print):
September 2010
Volume
: 108
Issue
: 5
Page
: 051101
Article
DOI:
10.1063/1.3474652
SO-VID:
2658f1fc-2f13-493c-959a-98af02c4222e
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© 2010
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