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      High aspect ratio silicon etch: A review

      , ,
      Journal of Applied Physics
      AIP Publishing

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          Most cited references105

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          Anisotropic etching of silicon

          K.E. Bean (1978)
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            Microscopic uniformity in plasma etching

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              Characterization of a Time Multiplexed Inductively Coupled Plasma Etcher

              A. Ayón (1999)
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                Author and article information

                Journal
                Journal of Applied Physics
                Journal of Applied Physics
                AIP Publishing
                0021-8979
                1089-7550
                September 2010
                September 2010
                : 108
                : 5
                : 051101
                Article
                10.1063/1.3474652
                2658f1fc-2f13-493c-959a-98af02c4222e
                © 2010
                History

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