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SU8 photoresist as an etch mask for local deep anodic etching of silicon
Author(s):
Victor V. Starkov
,
E. Yu. Gavrilin
,
J. Konle
,
H. Presting
,
A. Vyatkin
,
U Konig
Publication date:
2003
Journal:
phys. stat. sol. (a)
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DOI::
10.1002/pssa.200306491
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