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      • Record: found
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      Is Open Access

      Low-temperature growth of boron carbide coatings by direct current magnetron sputtering and high-power impulse magnetron sputtering

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          A novel pulsed magnetron sputter technique utilizing very high target power densities

          Vladímir Kouznetsov, Ivan Petrov, Ulf Helmersson … (1999)
          Article 0 comments Cited 202 times – based on 0 reviews     Review now
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            Boron carbide—A comprehensive review

            Francois Thévenot (1990)
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              Intrinsic stress in sputter-deposited thin films

              Henry Windischmann (1992)
              Article 0 comments Cited 88 times – based on 0 reviews     Review now
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                Author and article information

                Journal
                Title: Journal of Materials Science
                Abbreviated Title: J Mater Sci
                Publisher: Springer Nature America, Inc
                ISSN (Print): 0022-2461
                ISSN (Electronic): 1573-4803
                Publication date Created: December 2016
                Publication date (Electronic): August 1 2016
                Publication date (Print): December 2016
                Volume: 51
                Issue: 23
                Pages: 10418-10428
                Article
                DOI: 10.1007/s10853-016-0262-4
                SO-VID: 29b30c1e-06ce-4936-bb51-0ac086a9a64e
                Copyright © © 2016
                License:

                http://creativecommons.org/licenses/by/4.0

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