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      Nitrogen ion bombardment of multilayer graphene films grown on Cu foil by LPCVD

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          Abstract

          Multilayer graphene films were synthesized on copper foil by means of low pressure chemical vapor deposition and characterized using Raman spectroscopy. Low energy nitrogen bombardment was performed to form N-doped graphene, which is a metal catalyst method to induce nitrogen disorder in the carbon network. In order to investigate the effect of the nitrogen bombardment on graphene, Raman spectroscopy, X-ray photoelectron spectroscopy, scanning electron microscopy and atomic force microscopy are used. Analysis before and after the bombardment reveals that nitrogen doping of graphene is performed successfully by this method.

          Most cited references1

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          Ion Implantation in Diamond, Graphite and Related Materials

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            Author and article information

            Journal
            ijmr
            International Journal of Materials Research
            Carl Hanser Verlag
            1862-5282
            2195-8556
            10 February 2016
            : 107
            : 2
            : 177-183
            Affiliations
            a Plasma Physics Research Center, Science and Research Branch, Islamic Azad University, Tehran, Iran
            b Department of Physics, Karaj Branch, Islamic Azad University, Karaj, Iran
            Author notes
            [* ] Correspondence address, Azadeh Jafari, Plasma Physics Research Center, Science and Research Branch, Islamic Azad University, Poonak, Tehran, Iran. Tel.: +98 21 44865179, Fax: +98 21 44869625, E-mail: jafari_manesh@ 123456yahoo.com
            Article
            MK111326
            10.3139/146.111326
            2a6ebf19-6816-44df-a454-705a8d2322c0
            © 2016, Carl Hanser Verlag, München
            History
            : 28 May 2015
            : 8 September 2015
            : 3 December 2015
            Page count
            References: 46, Pages: 7
            Categories
            Original Contributions

            Materials technology,Materials characterization,Materials science
            Nitrogen bombardment,LPCVD,Multilayer graphene films,XPS,Raman spectroscopy

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