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      Enabling nanotechnology with self assembled block copolymer patterns

      Author(s): , ,
      Publication date Created:
      Publication date (Print):
      Journal: Polymer
      Publisher: Elsevier BV

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          Triblock Copolymer Syntheses of Mesoporous Silica with Periodic 50 to 300 Angstrom Pores

          D. Zhao (1998)
          Article 0 comments Cited 664 times – based on 0 reviews     Review now
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            Block Copolymers—Designer Soft Materials

            Frank Bates, Glenn H Fredrickson (1999)
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              Imprint Lithography with 25-Nanometer Resolution

              S Y Chou, P. Krauss, P. J. Renstrom (1996)
              Article 0 comments Cited 322 times – based on 0 reviews     Review now
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                Author and article information

                Journal
                Title: Polymer
                Abbreviated Title: Polymer
                Publisher: Elsevier BV
                ISSN (Print): 00323861
                Publication date Created: October 2003
                Publication date (Print): October 2003
                Volume: 44
                Issue: 22
                Pages: 6725-6760
                Article
                DOI: 10.1016/j.polymer.2003.08.011
                SO-VID: 2f048d2f-2e4c-4d83-acc2-439df69027d2
                Copyright © © 2003
                License:

                http://www.elsevier.com/tdm/userlicense/1.0/

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