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      Growth mechanism of polycrystalline silicon films from hydrogen-diluted SiCl4 at low temperature

      Author(s): , , , , , ,
      Publication date Created:
      Publication date (Print):
      Journal: Journal of Applied Physics
      Publisher: AIP Publishing

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          Particle generation and behavior in a silane‐argon low‐pressure discharge under continuous or pulsed radio‐frequency excitation

          A. Plain, C. Laure, J. Blondeau … (1991)
          Article 0 comments Cited 111 times – based on 0 reviews     Review now
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            Present and future applications of amorphous silicon and its alloys

            P.G. Le Comber (1989)
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              Thin-film poly-Si solar cells on glass substrate fabricated at low temperature

              K. Yamamoto, Y Okamoto, Y Tawada … (1999)
              Article 0 comments Cited 23 times – based on 0 reviews     Review now
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                Author and article information

                Journal
                Title: Journal of Applied Physics
                Abbreviated Title: Journal of Applied Physics
                Publisher: AIP Publishing
                ISSN (Print): 0021-8979
                ISSN (Electronic): 1089-7550
                Publication date Created: August 2005
                Publication date (Print): August 2005
                Volume: 98
                Issue: 3
                Page: 034907
                Article
                DOI: 10.1063/1.1996828
                SO-VID: 2f0fa289-c17b-4e78-9614-c25b86dbe1e5
                Copyright © © 2005
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