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      Sonochemical degradation of ciprofloxacin by hydrogen peroxide and persulfate activated by ultrasound and ferrous ions

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          Adsorptive removal of antibiotics from water and wastewater: Progress and challenges.

          Antibiotics as emerging contaminants are of global concern due to the development of antibiotic resistant genes potentially causing superbugs. Current wastewater treatment technology cannot sufficiently remove antibiotics from sewage, hence new and low-cost technology is needed. Adsorptive materials have been extensively used for the conditioning, remediation and removal of inorganic and organic hazardous materials, although their application for removing antibiotics has been reported for ~30 out of 250 antibiotics so far. The literature on the adsorptive removal of antibiotics using different adsorptive materials is summarized and critically reviewed, by comparing different adsorbents with varying physicochemical characteristics. The efficiency for removing antibiotics from water and wastewater by different adsorbents has been evaluated by examining their adsorption coefficient (Kd) values. For sulfamethoxazole the different adsorbents followed the trend: biochar (BC)> multi-walled carbon nanotubes (MWCNTs)>graphite = clay minerals, and for tetracycline the adsorptive materials followed the trend: SWCNT > graphite > MWCNT = activated carbon (AC) > bentonite = humic substance = clay minerals. The underlying controlling parameters for the adsorption technology have been examined. In addition, the cost of preparing adsorbents has been estimated, which followed the order of BCs < ACs < ion exchange resins < MWCNTs < SWCNTs. The future research challenges on process integration, production and modification of low-cost adsorbents are elaborated.
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            Sulfate radical-based ferrous–peroxymonosulfate oxidative system for PCBs degradation in aqueous and sediment systems

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              Efficient peroxydisulfate activation process not relying on sulfate radical generation for water pollutant degradation.

              Peroxydisulfate (PDS) is an appealing oxidant for contaminated groundwater and toxic industrial wastewaters. Activation of PDS is necessary for application because of its low reactivity. Present activation processes always generate sulfate radicals as actual oxidants which unselectively oxidize organics and halide anions reducing oxidation capacity of PDS and producing toxic halogenated products. Here we report that copper oxide (CuO) can efficiently activate PDS under mild conditions without producing sulfate radicals. The PDS/CuO coupled process is most efficient at neutral pH for decomposing a model compound, 2,4-dichlorophenol (2,4-DCP). In a continuous-flow reaction with an empty-bed contact time of 0.55 min, over 90% of 2,4-DCP (initially 20 μM) and 90% of adsorbable organic chlorine (AOCl) can be removed at the PDS/2,4-DCP molar ratio of 1 and 4, respectively. Based on kinetic study and surface characterization, PDS is proposed to be first activated by CuO through outer-sphere interaction, the rate-limiting step, followed by a rapid reaction with 2,4-DCP present in the solution. In the presence of ubiquitous chloride ions in groundwater/industrial wastewater, the PDS/CuO oxidation shows significant advantages over sulfate radical oxidation by achieving much higher 2,4-DCP degradation capacity and avoiding the formation of highly chlorinated degradation products. This work provides a new way of PDS activation for contaminant removal.
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                Author and article information

                Journal
                Colloids and Surfaces A: Physicochemical and Engineering Aspects
                Colloids and Surfaces A: Physicochemical and Engineering Aspects
                Elsevier BV
                09277757
                June 2022
                June 2022
                : 642
                : 128627
                Article
                10.1016/j.colsurfa.2022.128627
                3e852dca-53a3-4b31-828f-a1a7ff464d2d
                © 2022

                https://www.elsevier.com/tdm/userlicense/1.0/

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