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      Epitaxial growth of Ge thick layers on nominal and 6° off Si(0 0 1); Ge surface passivation by Si

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          High-quality Ge epilayers on Si with low threading-dislocation densities

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            Controlling threading dislocation densities in Ge on Si using graded SiGe layers and chemical-mechanical polishing

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              Metal–semiconductor–metal near-infrared light detector based on epitaxial Ge/Si

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                Author and article information

                Journal
                Semiconductor Science and Technology
                Semicond. Sci. Technol.
                IOP Publishing
                0268-1242
                1361-6641
                May 01 2009
                May 14 2009
                March 27 2009
                : 24
                : 5
                : 055002
                Article
                10.1088/0268-1242/24/5/055002
                40ec3457-1258-49bc-91cd-c8f2a9d80547
                © 2009
                History

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