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      Self‐propagating explosive reactions in Al/Ni multilayer thin films

      Author(s): , , ,
      Publication date Created:
      Publication date (Print):
      Journal: Applied Physics Letters
      Publisher: AIP Publishing

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          Propagation of explosive crystallization in thin Rh–Si multilayer films

          J A Floro (1986)
          Article 0 comments Cited 22 times – based on 0 reviews     Review now
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            Initial phase formation and dissociation in the thin‐film Ni/Al system

            J. Mayer, E. G. Colgan, M Nastasi (1985)
            Article 0 comments Cited 21 times – based on 0 reviews     Review now
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              Explosive silicidation in nickel/amorphous‐silicon multilayer thin films

              C. Thompson, K N Tu, L. A. Clevenger (1990)
              Article 0 comments Cited 19 times – based on 0 reviews     Review now
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                Author and article information

                Journal
                Title: Applied Physics Letters
                Abbreviated Title: Appl. Phys. Lett.
                Publisher: AIP Publishing
                ISSN (Print): 0003-6951
                ISSN (Electronic): 1077-3118
                Publication date Created: September 17 1990
                Publication date (Print): September 17 1990
                Volume: 57
                Issue: 12
                Pages: 1262-1264
                Article
                DOI: 10.1063/1.103504
                SO-VID: 411cd544-6f92-4113-9496-8dd93569d0ac
                Copyright © © 1990
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