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      Metal toxicity and ectomycorrhizas

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      Physiologia Plantarum
      Wiley-Blackwell

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          Effect of heavy metal pollution on mycorrhizal colonization and function: physiological, ecological and applied aspects

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            Metal tolerance in plants

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              Three mechanisms for the calcium alleviation of mineral toxicities

              Ca2+ in rooting medium is essential for root elongation, even in the absence of added toxicants. In the presence of rhizotoxic levels of Al3+, H+, or Na+ (or other cationic toxicants), supplementation of the medium with higher levels of Ca2+ alleviates growth inhibition. Experiments to determine the mechanisms of alleviation entailed measurements of root elongation in wheat (Triticum aestivum L. cv Scout 66) seedlings in controlled medium. A Gouy-Chapman-Stern model was used to compute the electrical potentials and the activities of ions at the root-cell plasma membrane surfaces. Analysis of root elongation relative to the computed surface activities of ions revealed three separate mechanisms of Ca2+ alleviation. Mechanism I is the displacement of cell-surface toxicant by the Ca2+-induced reduction in cell-surface negativity. Mechanism II is the restoration of Ca2+ at the cell surface if the surface Ca2+ has been reduced by the toxicant to growth-limiting levels. Mechanism III is the collective ameliorative effect of Ca2+ beyond mechanisms I and II, and may involve Ca2+-toxicant interactions at the cell surface other than the displacement interactions of mechanisms I and II. Mechanism I operated in the alleviation of all of the tested toxicities; mechanism II was generally a minor component of alleviation; and mechanism III was toxicant specific and operated strongly in the alleviation of Na+ toxicity, moderately in the alleviation of H+ toxicity, and not at all in the alleviation of Al3+ toxicity.
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                Author and article information

                Journal
                Physiologia Plantarum
                Physiol Plant
                Wiley-Blackwell
                0031-9317
                1399-3054
                June 2000
                June 2000
                : 109
                : 2
                : 107-116
                Article
                10.1034/j.1399-3054.2000.100201.x
                43e2a9f2-2ec0-4911-9293-f5ac1e1ea641
                © 2000

                http://doi.wiley.com/10.1002/tdm_license_1.1

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