9
views
0
recommends
+1 Recommend
0 collections
    0
    shares
      • Record: found
      • Abstract: not found
      • Article: not found

      Silicon surface passivation by atomic layer deposited Al2O3

      , , , ,
      Journal of Applied Physics
      AIP Publishing

      Read this article at

      ScienceOpenPublisher
      Bookmark
          There is no author summary for this article yet. Authors can add summaries to their articles on ScienceOpen to make them more accessible to a non-specialist audience.

          Related collections

          Most cited references49

          • Record: found
          • Abstract: not found
          • Article: not found

          Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process

            Bookmark
            • Record: found
            • Abstract: not found
            • Article: not found

            Contactless determination of current–voltage characteristics and minority‐carrier lifetimes in semiconductors from quasi‐steady‐state photoconductance data

              Bookmark
              • Record: found
              • Abstract: not found
              • Article: not found

              Unusually low surface-recombination velocity on silicon and germanium surfaces.

                Bookmark

                Author and article information

                Journal
                Journal of Applied Physics
                Journal of Applied Physics
                AIP Publishing
                0021-8979
                1089-7550
                August 15 2008
                August 15 2008
                : 104
                : 4
                : 044903
                Article
                10.1063/1.2963707
                494f9741-3f2f-4da9-81db-573b198b0a81
                © 2008
                History

                Comments

                Comment on this article