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      Gate-Defined Confinement in Bilayer Graphene-Hexagonal Boron Nitride Hybrid Devices

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          Abstract

          We report on the fabrication and measurement of nanoscale devices that permit electrostatic confinement in bilayer graphene on a substrate. The graphene bilayer is sandwiched between hexagonal boron nitride bottom and top gate dielectrics. Top gates are patterned such that constrictions and islands can be electrostatically induced. The high quality of the devices becomes apparent from the smooth pinch-off characteristics of the constrictions at low temperature with features indicative of conductance quantization. The islands exhibit clear Coulomb blockade and single-electron transport.

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          Author and article information

          Journal
          Nano Letters
          Nano Lett.
          American Chemical Society (ACS)
          1530-6984
          1530-6992
          January 12 2012
          September 12 2012
          August 30 2012
          September 12 2012
          : 12
          : 9
          : 4656-4660
          Affiliations
          [1 ]Kavli Institute of Nanoscience, Delft University of Technology, P.O. Box 5046, 2600 GA Delft, The Netherlands
          [2 ]Advanced Materials Laboratory, National Institute for Materials Science, 1-1 Namiki, Tsukuba, 305-0044, Japan
          Article
          10.1021/nl301986q
          22906072
          5178cc87-63dd-491f-b8bc-8e4082f87c9c
          © 2012
          History

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