Conductive SU8 Photoresist for Microfabrication

Hofmann, H.; Renaud, P.; Jiguet, S.; Bertsch, A

doi:10.1002/adfm.200400575

Record: found
Abstract: not found
Article: not found

Conductive SU8 Photoresist for Microfabrication

Author(s): S. Jiguet , A. Bertsch , H. Hofmann , P. Renaud

Publication date Created: September 2005

Publication date (Print): September 2005

Journal: Advanced Functional Materials

Publisher: Wiley

Read this article at

ScienceOpenPublisher

Bookmark

There is no author summary for this article yet. Authors can add summaries to their articles on ScienceOpen to make them more accessible to a non-specialist audience.

Related collections

Author and article information

Journal

Title: Advanced Functional Materials

Abbreviated Title: Adv. Funct. Mater.

Publisher: Wiley

ISSN (Print): 1616-301X

ISSN (Electronic): 1616-3028

Publication date Created: September 2005

Publication date (Print): September 2005

Volume: 15

Issue: 9

Pages: 1511-1516

Article

DOI: 10.1002/adfm.200400575

SO-VID: 5b804c8d-299e-45b5-89de-f4fd56fea2fa

License:

http://doi.wiley.com/10.1002/tdm_license_1.1

History

Data availability:

Conductive SU8 Photoresist for Microfabrication

Read this article at

Related collections

ScienceOpen Research

Author and article information

Journal

Article

History

Comments

Comment on this article

Similar content 1,768

Cited by 13