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      Modeling of dual frequency capacitively coupled plasma sources utilizing a full-wave Maxwell solver: II. Scaling with pressure, power and electronegativity

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      Plasma Sources Science and Technology
      IOP Publishing

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          Principles of Plasma Discharges and Materials Processing

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            Frequency coupling in dual frequency capacitively coupled radio-frequency plasmas

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              Argon metastable densities in radio frequency Ar, Ar/O2 and Ar/CF4 electrical discharges

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                Author and article information

                Journal
                Plasma Sources Science and Technology
                Plasma Sources Sci. Technol.
                IOP Publishing
                0963-0252
                1361-6595
                October 01 2010
                October 01 2010
                : 19
                : 5
                : 055012
                Article
                10.1088/0963-0252/19/5/055012
                5eda3ac1-658a-4d82-bf62-9ffd7e1b83ce
                © 2010
                History

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