7
views
0
recommends
+1 Recommend
0 collections
    2
    shares
      • Record: found
      • Abstract: not found
      • Article: not found

      New approach to the high quality epitaxial growth of lattice‐mismatched materials

      ,
      Applied Physics Letters
      AIP Publishing

      Read this article at

      ScienceOpenPublisher
      Bookmark
          There is no author summary for this article yet. Authors can add summaries to their articles on ScienceOpen to make them more accessible to a non-specialist audience.

          Related collections

          Most cited references3

          • Record: found
          • Abstract: not found
          • Article: not found

          Calculation of critical layer thickness versus lattice mismatch for GexSi1−x/Si strained‐layer heterostructures

            Bookmark
            • Record: found
            • Abstract: not found
            • Article: not found

            A new dielectric isolation method using porous silicon

            Kazuo Imai (1981)
              Bookmark
              • Record: found
              • Abstract: not found
              • Article: not found

              Molecular Beam Epitaxy of GexSi1-x/(Si Ge) Strained-Layer Heterostructures and Superlattices

                Bookmark

                Author and article information

                Journal
                Applied Physics Letters
                Appl. Phys. Lett.
                AIP Publishing
                0003-6951
                1077-3118
                July 21 1986
                July 21 1986
                : 49
                : 3
                : 140-142
                Article
                10.1063/1.97204
                61dbc5e4-5a37-4cd0-8765-55e1409c9166
                © 1986
                History

                Comments

                Comment on this article