Controlling the Solid-Phase Nucleation of Amorphous Si by Means of a Substrate Step Structure and Local Phosphorus Doping

Ohkura, Makoto; Moniwa, Masahiro; Kusukawa, Kikuo; Takeda, Eiji

doi:10.1143/JJAP.32.312

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Controlling the Solid-Phase Nucleation of Amorphous Si by Means of a Substrate Step Structure and Local Phosphorus Doping

Author(s): Masahiro Moniwa , Kikuo Kusukawa , Makoto Ohkura , Eiji Takeda

Publication date Created: January 30 1993

Publication date (Print): January 30 1993

Journal: Japanese Journal of Applied Physics

Publisher: Japan Society of Applied Physics

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Journal ID (publisher-id): JAPNDE

Title: Japanese Journal of Applied Physics

Abbreviated Title: Jpn. J. Appl. Phys.

Publisher: Japan Society of Applied Physics

ISSN (Print): 0021-4922

ISSN (Electronic): 1347-4065

Publication date Created: January 30 1993

Publication date (Print): January 30 1993

Volume: 32

Issue: Part 1, No. 1B

Pages: 312-317

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DOI: 10.1143/JJAP.32.312

SO-VID: 624aec86-d48a-477a-a469-5d035da34d42

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Controlling the Solid-Phase Nucleation of Amorphous Si by Means of a Substrate Step Structure and Local Phosphorus Doping

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