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      Strain in epitaxial CoSi2films on Si (111) and inference for pseudomorphic growth

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      Applied Physics Letters
      AIP Publishing

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          Formation of Ultrathin Single-Crystal Silicide Films on Si: Surface and Interfacial Stabilization of Si-Ni\({\mathrm{Si}}_{2}\)Epitaxial Structures

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            Epitaxial silicides

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              Growth of single‐crystal CoSi2on Si(111)

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                Author and article information

                Journal
                Applied Physics Letters
                Appl. Phys. Lett.
                AIP Publishing
                0003-6951
                1077-3118
                October 30 1989
                October 30 1989
                : 55
                : 18
                : 1874-1876
                Article
                10.1063/1.102327
                6859f6f9-72e1-4bbe-9363-725f4e439309
                © 1989
                History

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