10
views
0
recommends
+1 Recommend
0 collections
    0
    shares
      • Record: found
      • Abstract: not found
      • Article: not found

      Alternating Reversed Scanning Sequence for Improved Within-Wafer Uniformity During Nonmelt Laser Annealing of Arsenic-Implanted Silicon

      Read this article at

      ScienceOpenPublisher
      Bookmark
          There is no author summary for this article yet. Authors can add summaries to their articles on ScienceOpen to make them more accessible to a non-specialist audience.

          Related collections

          Author and article information

          Journal
          IEEE Transactions on Semiconductor Manufacturing
          IEEE Trans. Semicond. Manufact.
          Institute of Electrical and Electronics Engineers (IEEE)
          0894-6507
          1558-2345
          May 2010
          May 2010
          : 23
          : 2
          : 340-343
          Article
          10.1109/TSM.2010.2045589
          6b12593c-6a5e-4a25-94f1-7b33a8a86e3e
          © 2010
          History

          Comments

          Comment on this article