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      Monolayer hexagonal boron nitride films with large domain size and clean interface for enhancing the mobility of graphene-based field-effect transistors.

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          Abstract

          Viable and general techniques that allow effective size control of triangular-shaped, single-crystal, monolayer h-BN domains grown by the CVD method, direct optical visualization of h-BN domains, and the cleaning of the h-BN surface to achieve reliable graphene device quality are reported for the first time. This study points to a critical role of the interfacial properties between the graphene and the monolayer h-BN in determining reliable, enhanced graphene-device performance.

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          Author and article information

          Journal
          Adv. Mater. Weinheim
          Advanced materials (Deerfield Beach, Fla.)
          1521-4095
          0935-9648
          Mar 12 2014
          : 26
          : 10
          Affiliations
          [1 ] Beijing National Laboratory for Molecular Sciences, Key Laboratory of Organic Solids, Institute of Chemistry, Chinese Academy of Science, Beijing, 100190, P. R. China; Key Lab of Microsystem and Microstructure, Harbin Institute of Technology, Harbin, 150080, P. R. China.
          Article
          10.1002/adma.201304937
          24343959
          6ed2bdf8-c79a-422c-a543-2b965097236e
          © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
          History

          chemical vapor deposition,electronic devices,graphene,hexagonal boron nitride,interfaces

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