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      Group III Impurity Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering

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      Japanese Journal of Applied Physics
      Japan Society of Applied Physics

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          Journal
          JJAP
          Japanese Journal of Applied Physics
          Jpn. J. Appl. Phys.
          Japan Society of Applied Physics
          0021-4922
          October 20 1985
          October 20 1985
          : 24
          : Part 2, No. 10
          : L781-L784
          Article
          10.1143/JJAP.24.L781
          6f33225e-8a3e-4429-a767-56f52860d175
          © 1985
          History

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