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      An Extended Kalman filtering-based method of processing reflectometry data for fast in-situ etch rate measurements

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          Investigation of effective-medium models of microscopic surface roughness by spectroscopic ellipsometry

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            Optimal adaptive estimation of sampled stochastic processes

            D. Magill (1965)
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              Control of semiconductor manufacturing equipment: real-time feedback control of a reactive ion etcher

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                Author and article information

                Journal
                IEEE Transactions on Semiconductor Manufacturing
                IEEE Trans. Semicond. Manufact.
                Institute of Electrical and Electronics Engineers (IEEE)
                08946507
                Feb. 1997
                : 10
                : 1
                : 42-51
                Article
                10.1109/66.554482
                6f753bb0-b1d9-4b6b-9e5f-5b9d07cab2c8
                © 1997
                History

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