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      Design and First Tests of a Radiation-Hard Pixel Sensor for the European X-Ray Free-Electron Laser

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          Abstract

          The high intensity and high repetition rate of the European X-ray Free-Electron Laser, presently under construction in Hamburg, requires silicon sensors which can stand X-ray doses of up to 1 GGy for 3 years of operation at high bias voltage. Within the AGIPD Collaboration the X-ray-radiation damage in MOS Capacitors and Gate-Controlled Diodes fabricated by four vendors on high-ohmic n-type silicon with two crystal orientations and dif- ferent technological parameters, has been studied for doses between 1 kGy and 1 GGy. The extracted values of oxide-charge and surface-current densi- ties have been used in TCAD simulations, and the layout and technological parameters of the AGIPD pixel sensor optimized. It is found that the op- timized layout for high X-ray doses is significantly different from the one for non-irradiated sensors. First sensors and test structures have been de-livered in early 2013. Measurement results for X-ray doses of 0 to 10 MGy and their comparison to simulations are presented. They demonstrate that the optimization has been successful and that the sensors fulfill the required specifications.

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          Design of the AGIPD Sensor for the European XFEL

          For experiments at the European X-Ray Free-Electron Laser (XFEL) the Adaptive Gain Integrating Pixel Detector (AGIPD) is under development. The particular requirements for the detector are a high dynamic range of 0, 1 - to more than 10E4 12.4 keV photons per pixel within an XFEL pulse duration of < 100 fs, and a radiation tolerance of doses up to 1 GGy for 3 years of operation. The detector will have 1024 x 1024 p+ pixels with a pixel size of 200 um x 200 um and will be manufactured on 500 um thick n-type silicon. The design value for the operating voltage is 500 V, however, for special applications an operation up to ~ 1000 V should be possible. Experimental data on the dose dependence of the surface density of oxide charges at the Si-SiO2 interface and the surface-current density have been implemented in the SYNOPSYS TCAD simulation program in order to optimize the design of the pixel and guard-ring layout. The methodology of the sensor design, the optimization of the most relevant parameters and the layout are demonstrated. Finally the simulated performance, in particular the breakdown voltage, dark current and inter-pixel capacitance as function of the X-ray dose will be presented.
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            Journal
            13 February 2014
            Article
            10.1109/TNS.2014.2304239
            1402.3129
            712d4ee5-aeb9-4278-9ab7-3baec9f39e5e

            http://creativecommons.org/licenses/by-nc-sa/3.0/

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            physics.ins-det

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