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      Electron resonant tunneling in Si/SiGe double barrier diodes

      , ,
      Applied Physics Letters
      AIP Publishing

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          Resonant tunneling through quantum wells at frequencies up to 2.5 THz

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            Strain-induced two-dimensional electron gas in selectively doped Si/SixGe1-x superlattices.

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              Low‐temperature silicon epitaxy by ultrahigh vacuum/chemical vapor deposition

                Author and article information

                Journal
                Applied Physics Letters
                Appl. Phys. Lett.
                AIP Publishing
                0003-6951
                1077-3118
                August 19 1991
                August 19 1991
                : 59
                : 8
                : 973-975
                Article
                10.1063/1.106319
                75b5c524-8b06-43b4-8525-5371f2ebe045
                © 1991
                History

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