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Maskless lithography based on digital micromirror device (DMD) and double sided microlens and spatial filter array
Author(s):
D.-H. Dinh
,
H.-L. Chien
,
Y.-C. Lee
,
Duc-Hanh Dinh
,
Hung-Liang Chien
,
Yung-Chun Lee
,
D. Dinh
,
H. Y. Chien
,
Y. T. Lee
,
D.H DINH
,
Y.C LEE
Publication date:
2019
Journal:
Optics & Laser Technology
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Recursive Rule based Visual Categorization
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DOI::
10.1016/j.optlastec.2019.01.001
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