Silicon-doped hafnium oxide anti-ferroelectric thin films for energy storage

[1 ]Key Laboratory of Materials Modification by Laser, Ion, and Electron Beams (Ministry of Education), School of Materials Science and Engineering, Dalian University of Technology, Dalian 116024, China

[2 ]Department of Electronic Engineering, Dalian Neusoft University of Information, Dalian 116023, China

[3 ]NaMLab gGmbH/TU Dresden, Noethnitzer Str. 64, Dresden D-01187, Germany

[4 ]Fraunhofer IPMS, Koenigsbruecker Str. 178, Dresden 01099, Germany

[5 ]Key Laboratory of Inorganic Functional Materials and Devices, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, China