2
views
0
recommends
+1 Recommend
0 collections
    0
    shares
      • Record: found
      • Abstract: not found
      • Article: not found

      Polycrystalline silicon-germanium films for integrated microsystems

      , , ,
      Journal of Microelectromechanical Systems
      Institute of Electrical and Electronics Engineers (IEEE)

      Read this article at

      ScienceOpenPublisher
      Bookmark
          There is no author summary for this article yet. Authors can add summaries to their articles on ScienceOpen to make them more accessible to a non-specialist audience.

          Related collections

          Most cited references32

          • Record: found
          • Abstract: not found
          • Article: not found

          A MEMS-based projection display

            Bookmark
            • Record: found
            • Abstract: not found
            • Article: not found

            Experimental determination of the maximum post-process annealing temperature for standard CMOS wafers

              Bookmark
              • Record: found
              • Abstract: not found
              • Article: not found

              Post-CMOS processing for high-aspect-ratio integrated silicon microstructures

                Bookmark

                Author and article information

                Journal
                Journal of Microelectromechanical Systems
                J. Microelectromech. Syst.
                Institute of Electrical and Electronics Engineers (IEEE)
                1057-7157
                April 2003
                April 2003
                : 12
                : 2
                : 160-171
                Article
                10.1109/JMEMS.2002.805051
                7d6ecc0b-6bf0-4be8-a47f-7f48e9a57e06
                © 2003
                History

                Comments

                Comment on this article