Origin of reflection high-energy electron-diffraction intensity oscillations during molecular-beam epitaxy: A computational modeling approach.

doi:10.1103/PhysRevLett.58.2235

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Origin of reflection high-energy electron-diffraction intensity oscillations during molecular-beam epitaxy: A computational modeling approach.

Author(s): Clarke , Vvedensky

Publication date (Electronic): May 25 1987

Journal: Physical review letters

Publisher: American Physical Society (APS)

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Journal ID (iso-abbrev): Phys. Rev. Lett.

Title: Physical review letters

Publisher: American Physical Society (APS)

ISSN (Electronic): 1079-7114

ISSN (Print): 0031-9007

Publication date (Electronic): May 25 1987

Volume: 58

Issue: 21

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DOI: 10.1103/PhysRevLett.58.2235

PubMed ID: 10034688

SO-VID: 7d865f85-2976-4a6f-bb6b-03e7dcf0621f

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Origin of reflection high-energy electron-diffraction intensity oscillations during molecular-beam epitaxy: A computational modeling approach.

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