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      Atomic layer deposition (ALD): from precursors to thin film structures

      Author(s): ,
      Publication date Created:
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      Journal: Thin Solid Films
      Publisher: Elsevier BV

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          High-κ gate dielectrics: Current status and materials properties considerations

          G. D. Wilk, J. M. Anthony, R. M. Wallace (2001)
          Article 0 comments Cited 958 times – based on 0 reviews     Review now
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            Structure and stability of ultrathin zirconium oxide layers on Si(001)

            E. Gusev, M. Gribelyuk, M Copel (2000)
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              Atomic layer epitaxy

              Tuomo Suntola (1989)
              Article 0 comments Cited 122 times – based on 0 reviews     Review now
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                Author and article information

                Journal
                Title: Thin Solid Films
                Abbreviated Title: Thin Solid Films
                Publisher: Elsevier BV
                ISSN (Print): 00406090
                Publication date Created: April 2002
                Publication date (Print): April 2002
                Volume: 409
                Issue: 1
                Pages: 138-146
                Article
                DOI: 10.1016/S0040-6090(02)00117-7
                SO-VID: 8188a386-3601-4387-a634-f20e16ddba49
                Copyright © © 2002
                License:

                http://www.elsevier.com/tdm/userlicense/1.0/

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