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      First principles study of Si etching by CHF3 plasma source

      , , , , ,
      Applied Surface Science
      Elsevier BV

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          Journal
          Applied Surface Science
          Applied Surface Science
          Elsevier BV
          01694332
          August 2011
          August 2011
          : 257
          : 21
          : 8767-8771
          Article
          10.1016/j.apsusc.2011.03.147
          83a0fe80-0fa1-4da1-a8e2-778abc1fa1e5
          © 2011

          https://www.elsevier.com/tdm/userlicense/1.0/

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