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Atomic layer deposition of AlN using atomic layer annealing—Towards high-quality AlN on vertical sidewalls
Author(s):
Elmeri Österlund
,
Heli Seppanen
,
Kristina Bespalova
,
Ville Miikkulainen
,
Mervi Paulasto-Krockel
Publication date:
2021
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
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Atomic Force Microscopy
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DOI::
10.1116/6.0000724
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