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      Quantitative SEM characterisation of ceramic target prior and after magnetron sputtering: a case study of aluminium zinc oxide

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          Summary

          Till now electron microscopy techniques have not been used to evaluate the plasma–target interactions undergone during the magnetron sputtering process. The destructive nature of this interaction severely alters the target microstructure. Utilising quantitative microscopy techniques can shed light on the complex plasma and solid‐state processes involved which can ultimately lead to improved functional thin film deposition. As a representative functional material, aluminium‐doped‐zinc oxide (AZO) is an upcoming alternative to conventional transparent electrode wherein the process optimisation is of great importance. In this paper, we evaluate the pre‐ and post‐sputter field emission scanning electron microscopy (FESEM) data for ceramic AZO target fabricated at three final sintering temperatures (1100°C, 1200°C and 1300°C). In all cases, grain boundaries are merged in addition to a visible reduction in the secondary phases which makes segmentation‐based image analysis challenging. Through surface statistics (i.e. fractal dimension, autocorrelation length, texture aspect ratio and entropy) as a function of magnification we can quantify the electron microscopy image of the microstructure. We show that the plasma–microstructure interaction leads to an increase in autocorrelation length, texture aspect ratio and entropy for the optimum AZO ceramic sputtering target sintered at 1200°C. Furthermore, a maximum reduction in fractal dimension span (as determined by exponential regression) is also observed for 1200°C. In addition to the evaluation of plasma effects on sintering, our approach can provide a window towards understanding the underlying thin film growth mechanisms. We believe that this technique can be applied to the defect characterisation of a wide range of polycrystalline ceramic sputtering targets (e.g. ITO, CZTS, GAZO and so on) with the ultimate goal of improving the magnetron sputtering process and the resulting functional thin film.

          Lay Description

          Magnetron sputtering allows scientists to make functional thin films on the order of the nanoscale. In this technique, atoms are plucked from a ‘target’ then placed onto a substrate forming a thin nanometric film: all thanks to magnets, a special power supply and the fourth state of matter (plasma). Understanding what is going on and how to make a ‘good’ thin film is important for making better light emitting diodes, solar cells and light sensors. Scientists use electron microscopy to see what is going on in the microstructure of the sputtered thin films to fine tune the sputtering recipe. Here, for the first time, we have applied electron microscopy to see the surface of the microstructure before and after magnetron sputtering. This will help us understanding the plasma–microstructure interaction allowing us to make more informed decisions when fine‐tuning the sputtering process to get improved thin films. This is a case study of aluminium‐doped zinc oxide (AZO) target that could potentially replace indium tin oxide (ITO), which is widely used as a transparent electrode in devices involving light and electricity. In this case, improved characteristics would be lower electrical resistivity and higher transmission of light. We show that it is possible to use a mathematical description (e.g. the fractal dimension) of the scanning electron microscopy picture to show a link between the target surface and the functional properties.

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              Bottom-up engineering of thermoelectric nanomaterials and devices from solution-processed nanoparticle building blocks.

              The conversion of thermal energy to electricity and vice versa by means of solid state thermoelectric devices is extremely appealing. However, its cost-effectiveness is seriously hampered by the relatively high production cost and low efficiency of current thermoelectric materials and devices. To overcome present challenges and enable a successful deployment of thermoelectric systems in their wide application range, materials with significantly improved performance need to be developed. Nanostructuration can help in several ways to reach the very particular group of properties required to achieve high thermoelectric performances. Nanodomains inserted within a crystalline matrix can provide large charge carrier concentrations without strongly influencing their mobility, thus allowing to reach very high electrical conductivities. Nanostructured materials contain numerous grain boundaries that efficiently scatter mid- and long-wavelength phonons thus reducing the thermal conductivity. Furthermore, nanocrystalline domains can enhance the Seebeck coefficient by modifying the density of states and/or providing type- and energy-dependent charge carrier scattering. All these advantages can only be reached when engineering a complex type of material, nanocomposites, with exquisite control over structural and chemical parameters at multiple length scales. Since current conventional nanomaterial production technologies lack such level of control, alternative strategies need to be developed and adjusted to the specifics of the field. A particularly suitable approach to produce nanocomposites with unique level of control over their structural and compositional parameters is their bottom-up engineering from solution-processed nanoparticles. In this work, we review the state-of-the-art of this technology applied to the thermoelectric field, including the synthesis of nanoparticles of suitable materials with precisely engineered composition and surface chemistry, their combination and consolidation into nanostructured materials, the strategies to electronically dope such materials and the attempts to fabricate thermoelectric devices using nanoparticle-based nanopowders and inks.
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                Author and article information

                Contributors
                al6687ja-s@student.lu.se , alireza.jahangiri@srbiau.ac.ir
                Journal
                J Microsc
                J Microsc
                10.1111/(ISSN)1365-2818
                JMI
                Journal of Microscopy
                John Wiley and Sons Inc. (Hoboken )
                0022-2720
                1365-2818
                28 September 2020
                March 2021
                : 281
                : 3 ( doiID: 10.1111/jmi.v281.3 )
                : 190-201
                Affiliations
                [ 1 ] NanoLund Lund University Box 118, 22100 Lund Sweden
                [ 2 ] Department of Physics, Faculty of Science, Science and Research Branch Islamic Azad University Tehran Iran
                [ 3 ] Plasma Physics Research Centre, Science and Research Branch Islamic Azad University Tehran Iran
                [ 4 ] Nano‐Optoelectronics Laboratory, Sheykh Bahaee Research Complex, Science and Research Branch Islamic Azad University Tehran Iran
                [ 5 ] The Directorate of Research, Development and Innovation Management (DMCDI) Technical University of Cluj‐Napoca Cluj‐Napoca Cluj Romania
                Author notes
                [*] [* ]Correspondence to: A. R. Jahangiri, NanoLund, Lund University, Box 118, 22100 Lund, Sweden. Tel: +46 (0)46 222 00 00; e‐mail: al6687ja-s@ 123456student.lu.se , alireza.jahangiri@ 123456srbiau.ac.ir

                Author information
                https://orcid.org/0000-0003-1802-2147
                https://orcid.org/0000-0001-8607-8666
                https://orcid.org/0000-0001-9418-483X
                https://orcid.org/0000-0002-0038-7773
                https://orcid.org/0000-0003-1311-7657
                Article
                JMI12961
                10.1111/jmi.12961
                7891359
                32926411
                98557a3f-4c51-458e-ac66-fed2b70d9ae7
                © 2020 The Authors. Journal of Microscopy published by John Wiley & Sons Ltd on behalf of Royal Microscopical Society

                This is an open access article under the terms of the http://creativecommons.org/licenses/by-nc/4.0/ License, which permits use, distribution and reproduction in any medium, provided the original work is properly cited and is not used for commercial purposes.

                History
                : 12 July 2020
                : 08 August 2020
                : 03 September 2020
                Page count
                Figures: 6, Tables: 0, Pages: 12, Words: 8129
                Categories
                Original Article
                Original Articles
                Custom metadata
                2.0
                March 2021
                Converter:WILEY_ML3GV2_TO_JATSPMC version:5.9.7 mode:remove_FC converted:18.02.2021

                Microscopy & Imaging
                aluminium‐doped zinc oxide (azo),field‐emission scanning electron microscopy (fesem),image processing,magnetron sputtering,microstructure characterisation,plasma

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