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      Absence of13C incorporation in13CCl4‐doped InP grown by metalorganic chemical vapor deposition

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      Applied Physics Letters
      AIP Publishing

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          Controlled carbon doping of GaAs by metalorganic vapor phase epitaxy

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            Carbon doping in molecular beam epitaxy of GaAs from a heated graphite filament

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              Carbon diffusion in undoped,n‐type, andp‐type GaAs

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                Author and article information

                Journal
                Applied Physics Letters
                Appl. Phys. Lett.
                AIP Publishing
                0003-6951
                1077-3118
                April 30 1990
                April 30 1990
                : 56
                : 18
                : 1760-1762
                Article
                10.1063/1.103092
                9a689af6-d120-41f5-a9c1-a141e273bc02
                © 1990
                History
                Product
                Self URI (article page): http://aip.scitation.org/doi/10.1063/1.103092

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