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The redistribution of implanted dopants after metal‐silicide formation
Author(s):
M. Wittmer
,
T. E. Seidel
Publication date
Created:
December 1978
Publication date
(Print):
December 1978
Journal:
Journal of Applied Physics
Publisher:
AIP Publishing
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16
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Solid Solubilities of Impurity Elements in Germanium and Silicon*
F. Trumbore
(1960)
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Stopping cross sections and backscattering factors for 4He ions in matter Z = 1–92,
W.K. Chu
,
J.F. Ziegler
(1974)
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First phase nucleation in silicon–transition‐metal planar interfaces
R Walser
,
R. W. Bené
(1976)
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Author and article information
Journal
Title:
Journal of Applied Physics
Abbreviated Title:
Journal of Applied Physics
Publisher:
AIP Publishing
ISSN (Print):
0021-8979
ISSN (Electronic):
1089-7550
Publication date Created:
December 1978
Publication date (Print):
December 1978
Volume
: 49
Issue
: 12
Pages
: 5827-5834
Article
DOI:
10.1063/1.324599
SO-VID:
9ad80855-6ac7-47f9-bf23-fcbcff2e9b94
Copyright ©
© 1978
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