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      Interconnect Fabrication by Superconformal Iodine-Catalyzed Chemical Vapor Deposition of Copper

      , , , ,
      Journal of The Electrochemical Society
      The Electrochemical Society

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          Superconformal Electrodeposition of Copper

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            Superconformal Electrodeposition of Copper in 500–90 nm Features

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              Superconformal Electrodeposition in Submicron Features

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                Author and article information

                Journal
                JESOAN
                Journal of The Electrochemical Society
                J. Electrochem. Soc.
                The Electrochemical Society
                00134651
                2003
                2003
                : 150
                : 5
                : C368
                Article
                10.1149/1.1566960
                a1a735bc-44d7-4965-a87f-bc06cbce9fde
                © 2003
                History

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