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      A facile route to Si nanowire gate-all-around field effect transistors with a steep subthreshold slope

      , , , , ,
      Nanoscale
      Royal Society of Chemistry (RSC)

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          Most cited references32

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          Anisotropic Etching of Crystalline Silicon in Alkaline Solutions

          R H Seidel (1990)
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            FinFET-a self-aligned double-gate MOSFET scalable to 20 nm

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              Large-Scale Hierarchical Organization of Nanowire Arrays for Integrated Nanosystems

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                Author and article information

                Journal
                NANOHL
                Nanoscale
                Nanoscale
                Royal Society of Chemistry (RSC)
                2040-3364
                2040-3372
                2013
                2013
                : 5
                : 19
                : 8968
                Article
                10.1039/c3nr02552g
                a53e97a6-ae49-48da-8c5f-3998be54d120
                © 2013
                History

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